Elements of Plasma Technology

Nonfiction, Science & Nature, Technology, Microwaves, Science, Physics, Nuclear Physics
Cover of the book Elements of Plasma Technology by Rattachat Mongkolnavin, Chiow San Wong, Springer Singapore
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Author: Rattachat Mongkolnavin, Chiow San Wong ISBN: 9789811001178
Publisher: Springer Singapore Publication: December 24, 2015
Imprint: Springer Language: English
Author: Rattachat Mongkolnavin, Chiow San Wong
ISBN: 9789811001178
Publisher: Springer Singapore
Publication: December 24, 2015
Imprint: Springer
Language: English

This book presents some fundamental aspects of plasma technology that are important for beginners interested to start research in the area of plasma technology. These include the properties of plasma, methods of plasma generation and basic plasma diagnostic techniques. It also discusses several low cost plasma devices, including pulsed plasma sources such as plasma focus, pulsed capillary discharge, vacuum spark and exploding wire; as well as low temperature plasmas such as glow discharge and dielectric barrier discharge which the authors believe may have potential applications in industry. The treatments are experimental rather than theoretical, although some theoretical background is provided where appropriate. The principles of operation of these devices are also reviewed and discussed.

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This book presents some fundamental aspects of plasma technology that are important for beginners interested to start research in the area of plasma technology. These include the properties of plasma, methods of plasma generation and basic plasma diagnostic techniques. It also discusses several low cost plasma devices, including pulsed plasma sources such as plasma focus, pulsed capillary discharge, vacuum spark and exploding wire; as well as low temperature plasmas such as glow discharge and dielectric barrier discharge which the authors believe may have potential applications in industry. The treatments are experimental rather than theoretical, although some theoretical background is provided where appropriate. The principles of operation of these devices are also reviewed and discussed.

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