Interfacial Compatibility in Microelectronics

Moving Away from the Trial and Error Approach

Nonfiction, Science & Nature, Technology, Nanotechnology, Material Science
Cover of the book Interfacial Compatibility in Microelectronics by Toni T. Mattila, Mervi Paulasto-Kröckel, Tomi Laurila, Vesa Vuorinen, Jorma Kivilahti, Markus Turunen, Springer London
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Author: Toni T. Mattila, Mervi Paulasto-Kröckel, Tomi Laurila, Vesa Vuorinen, Jorma Kivilahti, Markus Turunen ISBN: 9781447124702
Publisher: Springer London Publication: January 10, 2012
Imprint: Springer Language: English
Author: Toni T. Mattila, Mervi Paulasto-Kröckel, Tomi Laurila, Vesa Vuorinen, Jorma Kivilahti, Markus Turunen
ISBN: 9781447124702
Publisher: Springer London
Publication: January 10, 2012
Imprint: Springer
Language: English

Interfaces between dissimilar materials are met everywhere in microelectronics and microsystems. In order to ensure faultless operation of these highly sophisticated structures, it is mandatory to have fundamental understanding of materials and their interactions in the system. In this difficult task, the “traditional” method of trial and error is not feasible anymore; it takes too much time and repeated efforts. In Interfacial Compatibility in Microelectronics, an alternative approach is introduced.

In this revised method four fundamental disciplines are combined: i) thermodynamics of materials ii) reaction kinetics iii) theory of microstructures and iv) stress and strain analysis. The advantages of the method are illustrated in Interfacial Compatibility in Microelectronics which includes:

 solutions to several common reliability issues in microsystem technology,

 methods to understand and predict failure mechanisms at interfaces between dissimilar materials and

 an approach to DFR based on deep understanding in materials science, rather than on the use of mechanistic tools, such as FMEA.

Interfacial Compatibility in Microelectronics provides a clear and methodical resource for graduates and postgraduates alike.

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Interfaces between dissimilar materials are met everywhere in microelectronics and microsystems. In order to ensure faultless operation of these highly sophisticated structures, it is mandatory to have fundamental understanding of materials and their interactions in the system. In this difficult task, the “traditional” method of trial and error is not feasible anymore; it takes too much time and repeated efforts. In Interfacial Compatibility in Microelectronics, an alternative approach is introduced.

In this revised method four fundamental disciplines are combined: i) thermodynamics of materials ii) reaction kinetics iii) theory of microstructures and iv) stress and strain analysis. The advantages of the method are illustrated in Interfacial Compatibility in Microelectronics which includes:

 solutions to several common reliability issues in microsystem technology,

 methods to understand and predict failure mechanisms at interfaces between dissimilar materials and

 an approach to DFR based on deep understanding in materials science, rather than on the use of mechanistic tools, such as FMEA.

Interfacial Compatibility in Microelectronics provides a clear and methodical resource for graduates and postgraduates alike.

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