Physical Design and Mask Synthesis for Directed Self-Assembly Lithography

Nonfiction, Science & Nature, Technology, Nanotechnology, Electronics, Circuits
Cover of the book Physical Design and Mask Synthesis for Directed Self-Assembly Lithography by Seongbo Shim, Youngsoo Shin, Springer International Publishing
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Author: Seongbo Shim, Youngsoo Shin ISBN: 9783319762944
Publisher: Springer International Publishing Publication: March 21, 2018
Imprint: Springer Language: English
Author: Seongbo Shim, Youngsoo Shin
ISBN: 9783319762944
Publisher: Springer International Publishing
Publication: March 21, 2018
Imprint: Springer
Language: English

This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.

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This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.

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