Soft X-Rays and Extreme Ultraviolet Radiation

Principles and Applications

Nonfiction, Science & Nature, Technology, Electronics, Optoelectronics, Nanotechnology
Cover of the book Soft X-Rays and Extreme Ultraviolet Radiation by David Attwood, Cambridge University Press
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Author: David Attwood ISBN: 9781139636421
Publisher: Cambridge University Press Publication: February 22, 2007
Imprint: Cambridge University Press Language: English
Author: David Attwood
ISBN: 9781139636421
Publisher: Cambridge University Press
Publication: February 22, 2007
Imprint: Cambridge University Press
Language: English

This detailed, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include spectromicroscopy, EUV astronomy, synchrotron radiation, and soft X-ray lasers. The author also provides a wealth of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practising engineers involved in semiconductor fabrication and materials science.

View on Amazon View on AbeBooks View on Kobo View on B.Depository View on eBay View on Walmart

This detailed, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include spectromicroscopy, EUV astronomy, synchrotron radiation, and soft X-ray lasers. The author also provides a wealth of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practising engineers involved in semiconductor fabrication and materials science.

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