Christopher Lyle Borst: 1 book
Chemical-Mechanical Polishing of Low Dielectric Constant Polymers and Organosilicate Glasses
Fundamental Mechanisms and Application to IC Interconnect Technology
Language: English
Release Date: November 27, 2013
As semiconductor manufacturers implement copper conductors in advanced interconnect schemes, research and development efforts shift toward the selection of an insulator that can take maximum advantage of the lower power and faster signal propagation allowed by copper interconnects. One of the main...
